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Low-pressure plasma processing BOMBARDMENT Atomic force microscopy Titanium dioxide Transmission electron microscopy Ambipolar material Avalanche breakdown Chemical and biological sensors Ablation laser A Chalcogenides AlN CNTs’ collapse CIGSe Mott insulator XPS Oxides A3 Physical vapor deposition processes Resistive switching Bipolar resistive switching BRS Thin films Band gap Plasmas froids Kirkendall effect CaTiO3Pr^3^+ X-ray photoelectron spectroscopy Semiconductors Optical properties B Chemical synthesis Chemical detection Capacitance Amorphous Alloying Carbon nitride B3 Solar cells B2 Quaternary Alzheimer's disease Mott insulators SF 6 Spectroscopic ellipsometry Chalcogenide glass B2 Semiconducting alloys Biomasse Sol-gel Carbon nanotubes V2O3 Carbon Nanotube CHLORINE PLASMAS Etching Structure Thin film Band alignment Applications industrielles Plasma etching Calcined clay B2 Semiconducting indium compounds C Photoelectron spectroscopy Magnetron sputtering Atomic layer etching Films Chalcogenide A1 Characterization Bixbyite Biocapteurs B1 Inorganic compounds Scanning electron microscopy AuCu alloy Argon InP chlorine etching inductive coupled plasma ICP modeling plasma sheath simulation Anatase A-CNx NEXAFS Buffer Couple A Thin films TiO2 Physical vapor deposition 3 nm in size Vanadium Sesquioxide Amyloid precursor Cathepsin Carbon Residual stress Functionalization Selenization Nanocomposite CH4 Aluminium nitride Sputtering Transfert d'énergie Copper AZO thin films Non-volatile memory X-ray diffraction Nanotubes Colloidal solution Adsorption Chalcogenides PECVD Aryl-diazonium salts Biofilms microbiens A Multilayers TEM